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つくばリポジトリ (Tulips-R) >
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Applied physics letters >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/2241/104207
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| Title: | Selective adsorption and patterning of Si nanoparticles fabricated by laser ablation on functionalized self-assembled monolayer |
| Authors: | Hata, K.
Fujita, M.
Yoshida, S.
Yasuda, S.
Makimura, T.
Murakami, K.
Shigekawa, H.
Mizutani, W.
Tokumoto, H.
吉田, 昭二
牧村, 哲哉
村上, 浩一
重川, 秀実 |
| Issue Date: | Jul-2001 |
| Publisher: | American Institute of Physics |
| Journal Title: | Applied physics letters |
| Volume: | 79 |
| Issue: | 5 |
| Start Page: | 692 |
| End Page: | 694 |
| DOI: | 10.1063/1.1388025 |
| Abstract: | We demonstrate an in situ selective adsorption of Si nanoparticles fabricated by laser ablation on a functionalized self-assembled monolayer (SAM). Si nanoparticles adsorbed on –CH3 terminated a SAM while Si particles did not adsorb on –NH2, –F, –OH, and –COOH, terminated SAMs. The end group of a SAM solely determines the selectivity against Si nanoparticle adsorption. We utilized the screening ability of functionalized SAMs to pattern Si nanoparticles onto desired locations on a Si substrate. |
| URI: | http://hdl.handle.net/2241/104207 |
| Rights: | ©2001 American Institute of Physics |
| Text Version: | publisher |
| Appears in Collections: | Applied physics letters
重川 秀実 (Shigekawa Hidemi)
村上 浩一 (Murakami Kouichi)
牧村 哲也 (Makimura Tetsuya)
吉田 昭二 (Yoshida Syoji)
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